Advanced Analytical Technologies for Multidisciplinary Material Characterization:
Next-Generation SEM, FIB and XPS Approaches
27th November 2025, Khamis
Bilik Seminar , Level 4, Blok T03,
Pusat Pengurusan Makmal Universiti (PPMU),
81310 Johor Bahru
Meneroka Teknologi Pencirian Bahan Generasi Baharu
Bengkel intensif ini memberi tumpuan kepada penerokaan mendalam Field Emission Scanning Electron Microscopy (FESEM) dan X-ray Photoelectron Spectroscopy (XPS) — dua teknologi canggih bagi imejan beresolusi tinggi serta analisis kimia permukaan yang tepat.
Peserta juga akan didedahkan kepada Dual Beam FIB–SEM, yang menawarkan kefahaman menyeluruh mengenai hubungan antara analisis permukaan dan struktur dalaman dalam pelbagai sampel seperti pemangkin (catalyst), bahan nano, logam, dan komponen mikroelektronik.
Sesuai untuk:
* Penyelidik dan saintis dalam bidang pemangkin, bahan nano dan bahan berfungsi
* Jurutera dan teknologis dari industri minyak & gas, logam, dan mikroelektronik
* Ahli akademik serta pelajar pascasiswazah yang ingin memperkukuh kepakaran dalam pencirian bahan lanjutan
* Profesional makmal yang terlibat dalam analisis permukaan, struktur atau komposisi
* Individu yang berminat menggunakan FESEM dan XPS untuk imejan resolusi tinggi serta penilaian keadaan kimia
Jangan lepaskan peluang ini untuk memperkukuh kepakaran anda dalam bidang pencirian bahan berteknologi tinggi!
_____________________________________________________________
Advanced Analytical Technologies for Multidisciplinary Material Characterization: Next-Generation SEM, FIB and XPS Approaches
27th November 2025, Khamis
Bilik Seminar , Level 4, Block T03,
Pusat Pengurusan Makmal Universiti (PPMU),
81310 Johor Bahru
Explore Next-Generation Material Characterization Technologies
Explore Next-Generation Material Characterization Technologies
This workshop offers an in-depth exploration of advanced Field Emission Scanning Electron Microscopy (FESEM) and X-ray Photoelectron Spectroscopy
(XPS) technologies for comprehensive material characterization. It focuses on how these next-generation tools deliver high-resolution imaging and precise
surface chemical analysis across catalysts, nanomaterials, metals, and microelectronic samples. Additional sessions on Dual Beam FIB–SEM will
provide supporting insights into correlative and sample preparation workflows, emphasizing a complete understanding from surface to structure.
This workshop is ideal for:
• Researchers and scientists working on catalysts, nanomaterials, and functional materials.
• Engineers and technologists from the oil & gas, metal, and microelectronics industries.
• Academics and postgraduate students seeking to enhance expertise in
advanced material characterization.
• Laboratory professionals involved in surface, structural, or compositional analysis.
• Anyone interested in applying FESEM and XPS for high-resolution imaging and chemical
state evaluation.
Don’t miss this opportunity to strengthen your expertise in advanced material characterization!
Next-Generation SEM, FIB and XPS Approaches
27th November 2025, Khamis
Bilik Seminar , Level 4, Blok T03,
Pusat Pengurusan Makmal Universiti (PPMU),
81310 Johor Bahru
Meneroka Teknologi Pencirian Bahan Generasi Baharu
Bengkel intensif ini memberi tumpuan kepada penerokaan mendalam Field Emission Scanning Electron Microscopy (FESEM) dan X-ray Photoelectron Spectroscopy (XPS) — dua teknologi canggih bagi imejan beresolusi tinggi serta analisis kimia permukaan yang tepat.
Peserta juga akan didedahkan kepada Dual Beam FIB–SEM, yang menawarkan kefahaman menyeluruh mengenai hubungan antara analisis permukaan dan struktur dalaman dalam pelbagai sampel seperti pemangkin (catalyst), bahan nano, logam, dan komponen mikroelektronik.
Sesuai untuk:
* Penyelidik dan saintis dalam bidang pemangkin, bahan nano dan bahan berfungsi
* Jurutera dan teknologis dari industri minyak & gas, logam, dan mikroelektronik
* Ahli akademik serta pelajar pascasiswazah yang ingin memperkukuh kepakaran dalam pencirian bahan lanjutan
* Profesional makmal yang terlibat dalam analisis permukaan, struktur atau komposisi
* Individu yang berminat menggunakan FESEM dan XPS untuk imejan resolusi tinggi serta penilaian keadaan kimia
Jangan lepaskan peluang ini untuk memperkukuh kepakaran anda dalam bidang pencirian bahan berteknologi tinggi!
_____________________________________________________________
Advanced Analytical Technologies for Multidisciplinary Material Characterization: Next-Generation SEM, FIB and XPS Approaches
27th November 2025, Khamis
Bilik Seminar , Level 4, Block T03,
Pusat Pengurusan Makmal Universiti (PPMU),
81310 Johor Bahru
Explore Next-Generation Material Characterization Technologies
Explore Next-Generation Material Characterization Technologies
This workshop offers an in-depth exploration of advanced Field Emission Scanning Electron Microscopy (FESEM) and X-ray Photoelectron Spectroscopy
(XPS) technologies for comprehensive material characterization. It focuses on how these next-generation tools deliver high-resolution imaging and precise
surface chemical analysis across catalysts, nanomaterials, metals, and microelectronic samples. Additional sessions on Dual Beam FIB–SEM will
provide supporting insights into correlative and sample preparation workflows, emphasizing a complete understanding from surface to structure.
This workshop is ideal for:
• Researchers and scientists working on catalysts, nanomaterials, and functional materials.
• Engineers and technologists from the oil & gas, metal, and microelectronics industries.
• Academics and postgraduate students seeking to enhance expertise in
advanced material characterization.
• Laboratory professionals involved in surface, structural, or compositional analysis.
• Anyone interested in applying FESEM and XPS for high-resolution imaging and chemical
state evaluation.
Don’t miss this opportunity to strengthen your expertise in advanced material characterization!
