Plasma Enhanced Chemical Vapour Deposition(PECVD) ,LAT Plasma Korea

1. Location : Clean Room Lab 01-89-01/02

2. Detail:

It is a chemical vapor deposition process used to deposit thin films from a gas state to a solid state on a substrate. It involves chemical reactions which occur after the creation of plasma of the reacting gases.This process has been used in semiconductor industry and in extensively use for MEMS application.

3.Please refer to P.I.C for quotation

4. Working Hours

Sun – Wednesday
9.00 am – 1.00 pm
2.00 pm – 4.00 pm

Thursday
9.00 am – 12.30 pm;
2.00 pm – 3.00 pm”

5.Status : Available for booking

6. PIC

Muhammad Sulaiman Bin Muhammad Zain
m.sulaiman@utm.my
07-5557729

7. SAMPLE SUBMISSION FORMS  click here