PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION LAT PLASMA KOREA (PECVD)
BRAND:
Description of Equipment
Chemical vapor deposition deposits thin films by reacting gases in plasma form. This process is widely used in the semiconductor industry and for MEMS applications.
Service Charge
RM500 per hour (without chemicals and silicone wafer) (depends on recipe)
For further information, kindly reach out our person-in-charge.
MUHAMMAD SULAIMAN BIN MUHAMMAD ZAIN
m.sulaiman@utm.my
07-533 3360
Status : Available | Unavailable
DISCLAIMER:
1) Basic charge does not include sample preparation, post analysis and consultation
2) Actual charges are subject to the official quotation issued by UIRL laboratory
Effective date: 21 January 2024
Office Address
T03 Building,
University Industry Research Laboratory,
Universiti Teknologi Malaysia,
81310 Skudai,
Johor, Malaysia.
UIRL counter hours
MONDAY – THURSDAY :
8.30am – 12.30pm
2.30pm – 4.30 pm
FRIDAY :
8.30am – 12.30pm
2.30pm – 4.30 pm
Contact us
UIRL Counter :
07-533 3360
